Beilstein J. Nanotechnol.2014,5, 1918–1925, doi:10.3762/bjnano.5.202
. By comparing the four different techniques, we evidence the limiting parameters for the writing speed. Wafer-scale fabrication of such arrays with 50 nm pitch allowed XPS analysis of a ferrocenylalkyl thiol self-assembled monolayer coated gold nanoarray.
Keywords: goldnanodot; gold nanoparticle
pattern, the stage moves from one main field to the other one. b) Schematic description of the 4 e-beam lithography techniques compared for their writing sequence inside a main field and their layout (BSS is the beam step size).
Scanning electron microscope (SEM) images of the goldnanodot arrays
PDF
Figure 1:
a) Schematic description of the writing strategy in e-beam lithography. The beam is deflected into ...